au.\*:("MULLER, Richard E")
Results 1 to 5 of 5
Selection :
Thickness-dependent optical properties of metals and alloys applicable to TPF coronagraph image masksBALASUBRAMANIAN, Kunjithapatham; WILSON, Daniel W; MULLER, Richard E et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66930Z.1-66930Z.11, issn 0277-786X, isbn 978-0-8194-6841-3Conference Paper
Stitching-error reduction in gratings by shot-shifted electron-beam lithographyDOUGHERTY, David J; MULLER, Richard E; MAKER, Paul D et al.Journal of lightwave technology. 2001, Vol 19, Num 10, pp 1527-1531, issn 0733-8724Article
Plasmonic Nanoparticle Arrays with Nanometer Separation for High-Performance SERS SubstratesTHEISS, Jesse; PAVASKAR, Prathamesh; ECHTERNACH, Pierre M et al.Nano letters (Print). 2010, Vol 10, Num 8, pp 2749-2754, issn 1530-6984, 6 p.Article
The JWST/NIRCam coronagraph flight occultersKRIST, John E; BALASUBRAMANIAN, Kunjithapatham; TRAUGER, John T et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7731, issn 0277-786X, isbn 978-0-8194-8221-1, 77313J.1-77313J.6, 3Conference Paper
The JWST/NIRCam coronagraph: mask design and fabricationKRIST, John E; BALASUBRAMANIAN, Kunjithapatham; WILSON, Daniel W et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7440, issn 0277-786X, isbn 978-0-8194-7730-9 0-8194-7730-3, 1Vol, 74400W.1-74400W.10Conference Paper